Features and Options |
Typical
Applications |
- Uniform, Lightsource
Systems
- Near, Mid and Deep UV Versions
- 200W to 5,000W Systems
- Intensity Controlling Powersupply Systems
- Shutter Controller
- Hi-Rel, Low Maintenance Design
- Excellent Documentation
|
- Photoresist Patterning
- Photoresist Stabilization
- Edge Bead Exposure
- Photoresist Modification
- Image Reversal
- Polymer Research
- PCM Processes
|
TYPICAL TECHNICAL SPECIFICATIONS
|
NEAR UV SYSTEMS |
DEEP
UV SYSTEMS |
Available Beam Sizes
|
100mm to 450mm
|
100mm to 200mm
|
Beam Divergence
|
2.6 deg. to < 1.2 deg.
|
2.6 deg. to < 2.3 deg.
|
Beam Uniformity
- Standard Systems
|
Diameters +/- 5%
Squares +/- 6%
|
Diameters +/- 5%
Squares +/- 6%
|
Beam -
High Uniformity Systems
|
Diameters +/- 2.5%
Squares +/- 3.5%
|
Diameters +/- 2.5%
Squares +/- 3.5%
|
Beam Spectrum
|
340nm - 450nm
|
220nm - 260nm
240nm - 275nm
|
Intensity @ 1,000W (200mm Dia.)
|
30mW/cm2 (UV365)
60 mW/cm2 (UV400)
|
~8 mW/cm2 (DUV220)
~12 mW/cm2 (DUV260)
|
Intensity @ 2,000W (300mm Dia.)
|
27 mW/cm2 (UV365)
54 mW/cm2 (UV400)
|
~8 mW/cm2 (DUV220)
~12 mW/cm2 (DUV260)
|