Features and Options |
Typical
Applications |
- Uniform, Lightsource
Systems
- Near, Mid and Deep UV Versions
- 200W to 5,000W Systems
- Intensity Controlling Powersupply Systems
- Shutter Controller
- Hi-Rel, Low Maintenance Design
- Excellent Documentation
|
- Photoresist Patterning
- Photoresist Stabilization
- Edge Bead Exposure
- Photoresist Modification
- Image Reversal
- Polymer Research
- PCM Processes
|
TYPICAL TECHNICAL SPECIFICATIONS
|
Near
UV Systems |
Deep
UV Systems |
Available Beam Sizes
|
100mm to 450mm
|
100mm to 300mm
|
Beam Divergence
|
2.6 deg. to < 1.2 deg.
|
2.6 deg. to < 1.2 deg.
|
Beam Uniformity
|
Diameters +/- 5%
Squares +/- 6%
|
Diameters +/- 5%
Squares +/- 6%
|
Beam Spectrum
|
340nm - 450nm
|
220nm - 260nm
240nm - 275nm
|
Intensity @ 500W (100mm Dia.)
|
40 mW/cm2 (UV365)
85 mW/cm2 (UV400)
|
17 mW/cm2 (DUV220)
20 mW/cm2 (DUV260)
|
Intensity @ 1,000W (100mm Dia.)
|
77 mW/cm2 (UV365)
170 mW/cm2 (UV400)
|
30 mW/cm2 (DUV220)
36 mW/cm2 (DUV260)
|
Intensity @ 2,000W (100mm Dia.)
|
150 mW/cm2 (UV365)
320 mW/cm2 (UV400)
|
60 mW/cm2 (DUV220)
70 mW/cm2 (DUV260)
|