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 LED LIGHTSOURCES USED/DEMO SYSTEMS
UV EXPOSURE SYSTEMS WITH ENCLOSURES

B&A offers a variety of high performance, collimated, and uncollimated UV Flood Exposure Systems. These systems are enhancing many of the photolithographic processes used by the Microelectronics Industry.
These exposure systems are designed for use in production as well as R&D applications. Near, Mid, and Deep UV systems are available with a variety of standard and optional features including beam sizes to 16" (400mm), intensity controlling powersupplies, and up to 2,000W capability.
The system's exposure optics employ a proven, high performance optic train that employs an elliptical reflector, a multi-element optical integrator system, heat removing primary and secondary mirrors, and output optics.

 Features and Options  Typical Applications
  • High Efficiency, Uniform, Lightsource
  • Systems Near, Mid and Deep UV Versions
  • 200W to 3,500W Systems
  • Regulated, Power-adjustable and Intensity Controlling Powersupply Systems
  • Digital Shutter Controller
  • High Rel, Low Maintenance Design
  • Patterning
  • PCM Processes
  • Photoresist Stabilization
  • UV Curing
  • Edge Bead Exposure
  • Photoresist Modification
  • Image Reversal

UV EXPOSURE SYSTEMS WITH ENCLOSURE(S)

         UV Exposure System with Rotation

Model LS-200 with Enclosure     180 Enclosure

TYPICAL TECHNICAL SPECIFICATIONS
   Near UV Systems  Deep UV Systems
 Beam Sizes
 100mm to 400mm
100mm to 250mm
 Beam Divergences
 As Required
 As Required
 Beam Uniformity
 Standard Systems
 Diameters:  +/- 5%
 Squares: +/- 6%
  Diameters: +/- 5%
  Squares: +/- 6% 
  Beam Spectrum
  340nm - 450nm
220nm - 260nm
240nm - 275nm
254nm - 325nm


SHORT OF FUNDS... TRY OUR "LEASE-TO-BUY" OPTION

For additional technical information and pricing contact us at...
Email: sales@bachur-n-associates.com
Tel: (408) 988-5861, Fax: (408) 982-9513